Kaohsiung, Taiwan

Yi-Ching Wu

This inventor holds 13 USPTO granted patents. Top assignee: United Microelectronics Corp.. Active years: 2007-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yi-Ching Wu. Retrieved from https://idiyas.com/inventor/yi-ching-wu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.2

ph-index = 4

Forward Citations = 64(Granted Patents)


Location History:

  • Kaohsiung County, TW (2007)
  • Yong-an Township, Kaohsiung County, TW (2007)
  • Kao-Hsiung Hsien, TW (2007 - 2011)
  • Kaohsiung, TW (2013 - 2015)
  • Hsinchu County, TW (2013 - 2015)
  • Zhudong Township, TW (2016)

Company Filing History:


Years Active: 2007-2016

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13 patents (USPTO):Explore Patents

Title: Yi-Ching Wu: Innovator in Semiconductor Technology

Introduction

Yi-Ching Wu is a prominent inventor based in Kao-Hsiung Hsien, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His work focuses on methods that enhance the manufacturing processes of semiconductor devices.

Latest Patents

Among his latest patents is a method for planarizing semiconductor devices. This innovative method involves several steps, including the provision of a substrate with a first dielectric layer covering at least one electrode structure. A chemical-mechanical polishing (CMP) process is performed on the first dielectric layer until the electrode structure is exposed. Following this, a second dielectric layer is deposited, covering both the electrode structure and the first dielectric layer. An etching-back process is then executed on the second dielectric layer until the electrode structure is again exposed.

Another notable patent is related to a semiconductor structure having a metal gate and its manufacturing method. This method begins with a substrate that has at least one first transistor formed on it. The first transistor includes a first conductivity type and a first metal gate, which is protected by a layer covering its sidewalls. The process involves removing a portion of the first metal gate to create a recess, followed by the removal of part of the protecting layer to form a second recess. An etch stop layer is then formed in the second recess, showcasing the complexity and innovation in his work.

Career Highlights

Yi-Ching Wu is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His expertise and innovative approaches have significantly impacted the development of advanced semiconductor technologies.

Collaborations

He has collaborated with notable coworkers, including Ming-Te Chen and Jiann-Fu Chen, contributing to various projects that enhance semiconductor manufacturing processes.

Conclusion

Yi-Ching Wu's contributions to semiconductor technology through his patents and work at United Microelectronics Corporation highlight his role as a key innovator in the field. His advancements continue to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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