Yi-Chao Wang

Title: Yi-Chao Wang: Innovator in Temperature Measurement and Wafer Annealing

Introduction

Yi-Chao Wang is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in temperature measurement and wafer processing. With a total of 3 patents, his work has advanced the efficiency and accuracy of thermal processes in semiconductor manufacturing.

Latest Patents

One of Yi-Chao Wang's latest patents is an "Apparatus, system, and method for measuring the temperature of a substrate." This innovative temperature measuring apparatus utilizes a light-emitting source that emits laser pulses directed at a substrate. A detector positioned opposite the light source captures the reflected laser pulses and emission signals related to the substrate's temperature. To enhance the signal-to-noise ratio, a polarizer is employed to polarize the laser pulses, and the angle of incidence can be adjusted for optimal detection.

Another notable patent is "Apparatus and methods for annealing wafers." This method involves performing an anneal on a wafer, which consists of a wafer-edge region and an inner region. During the annealing process, different power levels are applied to the wafer-edge region compared to the inner region, optimizing the thermal treatment of the wafer.

Career Highlights

Yi-Chao Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor technology.

Collaborations

Throughout his career, Yi-Chao Wang has collaborated with talented individuals such as Li-Ting Wang and Yu-Chang Lin. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Yi-Chao Wang's contributions to temperature measurement and wafer annealing have made a significant impact on the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in technology, showcasing his dedication to improving manufacturing processes.