Kyoto, Japan

Yasuyoshi Yasaka

This inventor holds 11 USPTO granted patents. Top assignees: Tokyo Electron Limited, Makoto Ando, Nihon Koshuha Co., Ltd.. Active years: 2001-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuyoshi Yasaka. Retrieved from https://idiyas.com/inventor/yasuyoshi-yasaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 54.5

Average Co-Inventor Count = 2.5

ph-index = 6

Forward Citations = 457(Granted Patents)


Location History:

  • Uji, JP (2001 - 2004)
  • Sudome, Kohata, Uji-Shi, Kyoto-fu, JP (2004)
  • Uji-shi, Kyoto-fu, JP (2003 - 2005)
  • Kohata, Uji-shi, Kyoto, JP (2005)
  • Kyoto, JP (2008)

Company Filing History:


Years Active: 2001-2008

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11 patents (USPTO):Explore Patents

Title: Innovator Yasuyoshi Yasaka: Pioneering Advances in Plasma Processing Technology

Introduction

Yasuyoshi Yasaka, an accomplished inventor based in Kyoto-fu, Japan, has made significant contributions to the field of plasma processing technology. With a robust portfolio consisting of 11 patents, Yasaka's innovations have paved the way for advancements in industrial and research applications.

Latest Patents

Among his notable inventions, Yasaka has developed several patented technologies aimed at enhancing plasma processing capabilities. His latest patents include a novel Plasma Processing Apparatus, which features a first conductive plate constituting the radiation surface of a slot antenna inclined with respect to a first dielectric member. This innovative design allows for a plasma generated by the electric field of an electromagnetic field entering directly from the slot antenna to be more dominant than a plasma generated by a standing wave. Such control significantly improves plasma distribution, which is crucial for various processing applications.

Another noteworthy patent by Yasaka details a plasma processing apparatus that includes a plasma processing chamber for processing objects, an antenna system for guiding microwaves into this chamber, and a specially designed dielectric member. The surface of the dielectric member facing the chamber possesses a projecting shape, further optimizing the efficiency of the plasma processing environment.

Career Highlights

Throughout his career, Yasuyoshi Yasaka has worked with various reputable organizations, notably Tokyo Electron Limited, where he honed his expertise in plasma technology. His experience at such prominent companies has enabled him to develop cutting-edge innovations that have broad applications across multiple industries.

Collaborations

Yasaka has collaborated with several esteemed colleagues in his field, including Nobuo Ishii and Makoto Ando. Their joint efforts in the domain of plasma processing have contributed to notable advancements, showcasing the importance of teamwork and collaboration in driving innovation.

Conclusion

Yasuyoshi Yasaka stands out as a remarkable inventor whose work in plasma processing technology continues to impact various sectors. With his impressive track record of patents and collaborative efforts with other industry leaders, Yasaka's contributions will undoubtedly influence future innovations in the field. His commitment to advancing technology positions him as a key figure in the ever-evolving landscape of industrial applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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