The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2003
Filed:
Nov. 30, 2000
Applicant:
Inventors:
Nobuo Ishii, Osaka-fu, JP;
Yasuyoshi Yasaka, Uji-Shi, Kyoto-Fu, JP;
Assignee:
Other;
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; C23C 1/400 ; H05H 1/00 ;
U.S. Cl.
CPC ...
C23C 1/600 ; C23C 1/400 ; H05H 1/00 ;
Abstract
A plasma processing system may include a vacuum vessel, a substrate table arranged in the vacuum vessel, and a radio-frequency power supply system for generating high-frequency waves. A waveguide may be provided for guiding high-frequency waves into the vacuum vessel, and a dielectric member may be arranged at an end portion of the waveguide. The plasma processing system may also include a conductive film arranged on the dielectric member and facing the substrate table, wherein the conductive film may have a thickness smaller than or approximately equal to a skin thickness of the conductive film.