The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2003
Filed:
Apr. 26, 2001
Nobuo Ishii, Amagasaki, JP;
Yasuyoshi Yasaka, Uji-Shi, Kyoto-Fu, JP;
Other;
Abstract
A plasma processing apparatus includes a processing container whose interior has a mount table, a glass plate for covering an upper opening of the processing container, a microwave supplier, a coaxial waveguide having its end connected with the microwave supplier to have an inner conductor and an outer conductor, a radial waveguide box connected to the other end of the outer conductor of the coaxial waveguide to expand from the other end of the outer conductor outward in the radial direction and extend downward, a disc-shaped antenna member for covering a lower opening of the radial waveguide box having its central part connected with the other end of the inner conductor, and a metallic reflector on the opposite side of the antenna member's part connected with the inner conductor.