The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2005
Filed:
Jan. 18, 2001
Nobuo Ishii, Amagasaki, JP;
Yasuyoshi Yasaka, Uji-Shi, Kyoto-Fu, JP;
Kibatsu Shinohara, Yokohama, JP;
Nobuo Ishii, Amagasaki, JP;
Yasuyoshi Yasaka, Uji-Shi, Kyoto-Fu, JP;
Kibatsu Shinohara, Yokohama, JP;
Tokyo Electron Ltd., Tokyo, JP;
Other;
Makoto Ando, Kanagawa-ken, JP;
Nihon Koshuha Co., Ltd., Kanagawa-ken, JP;
Abstract
A plasma processing apparatus that generates a uniform plasma, thus allowing uniform processing of large-diameter wafers. The cylindrical apparatus includes a wafer mounting table, a silica plate providing an airtight seal, a microwave supplier for propagating a microwave in TE11 mode, and a cylindrical waveguide connected at one end to the microwave supplier. A radial waveguide box is connected between the other end of the cylindrical waveguide and the silica plate. The radial waveguide box extends radially outward from the cylindrical waveguide, forming a flange and defining an interior waveguide space. A disc-shaped slot antenna is located at the lower end of the radial waveguide box, above the silica plate. A circularly-polarized wave converter disposed in the cylindrical waveguide rotates the TE11-mode microwave about the axis of the cylindrical waveguide, and sends the rotating microwave to the radial waveguide box.