The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2005
Filed:
Dec. 17, 2003
Applicants:
Nobuo Ishii, Kobe, JP;
Yasuyoshi Yasaka, Kohata, Uji-shi, Kyoto, JP;
Inventors:
Nobuo Ishii, Kobe, JP;
Yasuyoshi Yasaka, Kohata, Uji-shi, Kyoto, JP;
Assignees:
Tokyo Electron Limited, Tokyo, JP;
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K010/00 ;
U.S. Cl.
CPC ...
Abstract
A plasma processing apparatus, comprising: at least, a plasma processing chamber for processing therein an object to be processed; antenna means for guiding microwaves into the plasma processing chamber; and a dielectric member disposed between the antenna means and the plasma processing chamber; wherein a surface of the dielectric member facing the inside of the plasma processing chamber has a projecting shape.