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For the Inventor, By the Inventor

Kawasaki, Japan

Yasushi Kuroiwa

This inventor holds 8 USPTO granted patents. Top assignees: Tokyo Ohka Kogyo Co., Ltd., Tokyo Institute of Technology. Active years: 2015-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasushi Kuroiwa. Retrieved from https://idiyas.com/inventor/yasushi-kuroiwa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8

% Patents Active = 100.0

Average Co-Inventor Count = 2.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Kanagawa, JP (2015 - 2018)
  • Kawasaki, JP (2020 - 2023)

Company Filing History:

goldMedal8 out of 1,236 
 
Tokyo Ohka Kogyo Co., Ltd.
 patents
silverMedal1 out of 591 
 
Tokyo Institute of Technology
 patents
where one patent can have more than one assignee

Years Active: 2015-2023

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8 patents (USPTO):Explore Patents
1. 11803122 - Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound (2023-10-31),
2. 11474432 - Chemically amplified photosensitive composition, photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and compound (2022-10-18),
3. 11402755 - Chemically amplified positive-type photosensitive resin composition, method for manufacturing substrate with template, and method for manufacturing plated article (2022-08-02),
4. 11061326 - Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound (2021-07-13),
5. 11022880 - Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound (2021-06-01),
6. 10599036 - Chemically amplified positive-type photosensitive resin composition (2020-03-24),
7. 9977328 - Chemically amplified positive-type photosensitive resin composition for thick film (2018-05-22),
8. 9091916 - Positive-type photoresist composition, photoresist laminate, method for producing photoresist pattern, and method for producing connecting terminal (2015-07-28),

Title: Innovations of Yasushi Kuroiwa

Introduction

Yasushi Kuroiwa is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of chemical amplification-type photosensitive compositions. With a total of eight patents to his name, Kuroiwa's work has advanced the technology used in photolithography and resist film production.

Latest Patents

Kuroiwa's latest patents include a chemically amplified photosensitive composition, a photosensitive dry film, and various production methods for patterned resist layers and plated molded articles. His innovations focus on creating a chemically amplified photosensitive composition that is utilized for forming patterned resist films on metal surfaces. This composition features an acid generator that produces acid upon exposure to active rays or radioactive rays. Additionally, it includes a compound with a high molar absorption coefficient at a wavelength of 365 nm, which is essential for effective photolithography.

Career Highlights

Throughout his career, Kuroiwa has worked with notable organizations such as Tokyo Ohka Kogyo Co., Ltd. and the Tokyo Institute of Technology. His experience in these institutions has allowed him to refine his expertise in the development of advanced materials for photolithography.

Collaborations

Kuroiwa has collaborated with several professionals in his field, including Kazuaki Ebisawa and Yuta Yamamoto. These collaborations have contributed to the successful development of his patented technologies.

Conclusion

Yasushi Kuroiwa's contributions to the field of chemical amplification-type photosensitive compositions have significantly impacted the technology used in photolithography. His innovative patents and collaborations highlight his role as a leading inventor in this specialized area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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