Average Co-Inventor Count = 2.50
ph-index = 1
The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.
Company Filing History:
1. Tokyo Ohka Kogyo Co., Ltd. (8 from 1,233 patents)
2. Tokyo Institute of Technology (1 from 566 patents)
8 patents:
1. 11803122 - Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound
2. 11474432 - Chemically amplified photosensitive composition, photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and compound
3. 11402755 - Chemically amplified positive-type photosensitive resin composition, method for manufacturing substrate with template, and method for manufacturing plated article
4. 11061326 - Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound
5. 11022880 - Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound
6. 10599036 - Chemically amplified positive-type photosensitive resin composition
7. 9977328 - Chemically amplified positive-type photosensitive resin composition for thick film
8. 9091916 - Positive-type photoresist composition, photoresist laminate, method for producing photoresist pattern, and method for producing connecting terminal