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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11402755 B1

PDFFull Text
Date of Patent:
Aug. 02, 2022

Filed:

Mar. 06, 2019

Chemically amplified positive-type photosensitive resin composition, method for manufacturing substrate with template, and method for manufacturing plated article

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Yasushi Kuroiwa, Kawasaki, JP;

Yuta Yamamoto, Kawasaki, JP;

Assignees:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Tokyo Institute of Technology, Tokyo, JP;

Attorney:

Knobbe Martens Olson & Bear LLP

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/38 (2006.01); C08K 5/435 (2006.01); G03F 7/20 (2006.01); C08L 61/06 (2006.01); C08L 33/08 (2006.01); C08L 33/10 (2006.01); C08L 25/18 (2006.01); G03F 7/085 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C08K 5/435 (2013.01); C08L 25/18 (2013.01); C08L 33/08 (2013.01); C08L 33/10 (2013.01); C08L 61/06 (2013.01); G03F 7/0045 (2013.01); G03F 7/0397 (2013.01); G03F 7/085 (2013.01); G03F 7/2022 (2013.01); G03F 7/30 (2013.01); G03F 7/38 (2013.01);
Abstract

A chemically amplified positive-type photosensitive resin composition capable of forming a resist pattern having excellent cross-sectional perpendicularity of a nonresist section even when a resist pattern is formed on a metal surface, and a method for manufacturing a substrate with a template and a method for manufacturing a plated article using the composition. The composition contains an acid generator, a resin, and a sulfur-containing compound including a sulfur-containing compound and a thiol compound that is different from the sulfur-containing compound.

Find Patent Forward Citations

Kuroiwa, Yasushi. (2022). Chemically amplified positive-type photosensitive resin composition, method for manufacturing substrate with template, and method for manufacturing plated article (U.S. Patent No. 11402755). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11402755

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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