The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 13, 2021

Filed:

Sep. 20, 2018
Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Akiya Kawaue, Kawasaki, JP;

Yasushi Kuroiwa, Kawasaki, JP;

Shota Katayama, Kawasaki, JP;

Kazuaki Ebisawa, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C08G 75/04 (2016.01); G03F 7/20 (2006.01); G03F 7/039 (2006.01); G03F 7/085 (2006.01); C08G 75/14 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C08G 75/04 (2013.01); C08G 75/14 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/085 (2013.01); G03F 7/2039 (2013.01);
Abstract

A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of 'footing' in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than the top (the side proximal to the surface of a resist layer) in the nonresist portion when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate having a metal surface using the composition. A mercapto compound having the formula (C) shown below is added to the composition and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation and a resin the solubility of which in alkali increases under the action of acid: wherein n1, n2, R, and Rare defined in claim


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