The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2022

Filed:

Dec. 16, 2019
Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Akiya Kawaue, Kawasaki, JP;

Yasushi Kuroiwa, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/30 (2006.01); G03F 7/38 (2006.01); G03F 7/09 (2006.01); C07C 229/60 (2006.01); C08L 33/08 (2006.01); C08L 61/06 (2006.01); C08L 25/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C07C 229/60 (2013.01); G03F 7/0042 (2013.01); G03F 7/0045 (2013.01); G03F 7/0397 (2013.01); G03F 7/09 (2013.01); G03F 7/30 (2013.01); C08L 25/06 (2013.01); C08L 33/08 (2013.01); C08L 61/06 (2013.01); G03F 7/38 (2013.01);
Abstract

A chemically amplified photosensitive composition which forms a resist pattern whose cross-sectional shape is rectangular, and which has a wide depth of focus margin; a photosensitive dry film having a photosensitive layer made from the composition; a method of manufacturing a patterned-resist film using the composition; a method of manufacturing a substrate with a template using the composition; a method of manufacturing a plated article using the substrate with a template; and a novel compound. An acid diffusion suppressing agent having a specific structure is blended into the composition including an acid generator which generates acid upon exposure to an irradiated active ray or radiation.


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