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For the Inventor, By the Inventor

Minato-ku, Japan

Yasuhito Saiga

USPTO Granted Patents = 8

Average Co-Inventor Count = 4.1

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Tokyo, JP (2010 - 2014)
  • Minato-ku, JP (2011 - 2014)

Company Filing History:

goldMedal8 out of 10,295 
 
Tokyo Electron Limited
 patents

Years Active: 2010-2014

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8 patents (USPTO):Explore Patents
1. 8889337 - Film forming method, film forming apparatus and pattern forming method (2014-11-18),
2. 8702370 - Substrate transfer method for performing processes including photolithography sequence (2014-04-22),
3. 8236132 - Substrate processing system and substrate transfer method (2012-08-07),
4. 8133663 - Pattern forming method and apparatus (2012-03-13),
5. 8007968 - Substrate processing method, program, computer-readable storage medium and substrate processing system (2011-08-30),
6. 7901149 - Substrate processing method, program, computer-readable recording medium, and substrate processing system (2011-03-08),
7. 7826032 - Circulation system for high refractive index liquid in pattern forming apparatus (2010-11-02),
8. 7651285 - Edge exposure apparatus, coating and developing apparatus, edge exposure method and coating and developing method, and storage medium (2010-01-26),

Title: Yasuhito Saiga: Innovator in Film Forming Technologies

Introduction

Yasuhito Saiga is a prominent inventor based in Minato-ku, Japan. He has made significant contributions to the field of film forming technologies, holding a total of 8 patents. His work focuses on methods and apparatuses that enhance the efficiency and effectiveness of film formation processes.

Latest Patents

Among his latest patents, Yasuhito Saiga has developed a film forming method and apparatus that prevent the peeling of surface films, including resist films, from substrates during immersion exposure. This innovative method involves forming surface films, including a resist film and a protective film, over a wafer's surface. Additionally, he has created a substrate transfer method designed for photolithography processes, which utilizes automated substrate transfer lines to efficiently move target substrates among various process sections.

Career Highlights

Yasuhito Saiga is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has positioned him as a key player in advancing film forming technologies, contributing to the overall progress in semiconductor fabrication.

Collaborations

Throughout his career, Yasuhito has collaborated with notable colleagues, including Yoshiaki Yamada and Tadayuki Yamaguchi. These collaborations have further enriched his work and have led to innovative solutions in the field.

Conclusion

Yasuhito Saiga's contributions to film forming technologies and his innovative patents highlight his role as a significant inventor in the semiconductor industry. His work continues to influence advancements in manufacturing processes, showcasing the importance of innovation in technology.

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