The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2011
Filed:
Jul. 25, 2007
Yoshiaki Yamada, Koshi, JP;
Tadayuki Yamaguchi, Minato-ku, JP;
Yuuichi Yamamoto, Minato-ku, JP;
Yasuhito Saiga, Minato-ku, JP;
Kazuo Sawai, Minato-ku, JP;
Yoshiaki Yamada, Koshi, JP;
Tadayuki Yamaguchi, Minato-ku, JP;
Yuuichi Yamamoto, Minato-ku, JP;
Yasuhito Saiga, Minato-ku, JP;
Kazuo Sawai, Minato-ku, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
In the present invention, patterning for the first time is performed on a film to be worked above the front surface of a substrate, and the actual dimension of the pattern formed by the patterning for the first time is measured. Based on the dimension measurement result of the patterning or the first time, the condition of patterning for the second time is then set. In this event, the condition of the patterning for the second time is set so that a difference between the dimension of the patterning for the first time and its target dimension is equal to a difference between the dimension of the patterning for the second time and its target dimension. Thereafter, the patterning for the second time is performed under the set patterning condition.