The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 07, 2012

Filed:

Jun. 15, 2007
Applicants:

Yuichi Yamamoto, Minato-ku, JP;

Tadayuki Yamaguchi, Minato-ku, JP;

Yasuhito Saiga, Minato-ku, JP;

Yoshiaki Yamada, Minato-ku, JP;

Inventors:

Yuichi Yamamoto, Minato-ku, JP;

Tadayuki Yamaguchi, Minato-ku, JP;

Yasuhito Saiga, Minato-ku, JP;

Yoshiaki Yamada, Minato-ku, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B65G 49/07 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate processing system () includes a first automated substrate transfer line or main transfer line () configured to transfer wafers (W) over the entire system and to transfer wafers to and from respective process sections, and a second automated substrate transfer line or auxiliary transfer line () configured to transfer wafers (W) inside a photolithography process section (). The auxiliary transfer line () is disposed as a transfer mechanism independent of the main transfer line (). An OHT () is configured to travel around on the auxiliary transfer line () having a loop shape, so as to transfer wafers (W) to and from and among the respective process apparatuses in the photolithography process section ().


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