The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2012
Filed:
Jul. 24, 2007
Taro Yamamoto, Koshi, JP;
Hitoshi Kosugi, Koshi, JP;
Yoshiaki Yamada, Minato-ku, JP;
Yasuhito Saiga, Minato-ku, JP;
Taro Yamamoto, Koshi, JP;
Hitoshi Kosugi, Koshi, JP;
Yoshiaki Yamada, Minato-ku, JP;
Yasuhito Saiga, Minato-ku, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A pattern forming method includes forming a resist film or sequentially forming a resist film and a protection film in this order on a surface of a substrate; then, performing immersion light exposure that includes immersing the resist film or the resist film and the protection film formed on the substrate in a liquid during light exposure, thereby forming a predetermined light exposure pattern on the resist film; and performing a development process of the light exposure pattern by use of a development liquid, thereby forming a predetermined resist pattern. After the immersion light exposure and before the development process, the method further includes performing a hydrophilic process of turning a surface of the resist film or the protection film serving as a substrate surface into a hydrophilic state to allow the substrate surface to be wetted with the development liquid overall.