The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2014
Filed:
Nov. 02, 2007
Hitoshi Kosugi, Koshi, JP;
Taro Yamamoto, Koshi, JP;
Yoshiaki Yamada, Tokyo, JP;
Yasuhito Saiga, Tokyo, JP;
Hitoshi Kosugi, Koshi, JP;
Taro Yamamoto, Koshi, JP;
Yoshiaki Yamada, Tokyo, JP;
Yasuhito Saiga, Tokyo, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Such a film forming method is provided that can prevent peeling of surface films including a resist film from a substrate during immersion exposure. The film forming method includes the steps of forming surface films including a resist film and a protective film covering the resist film over a surface of a wafer, and forming an edge cap film by supplying an edge cap film material to at least a boundary portion including a periphery of the wafer and peripheries of the surface films such as the protective film.