Tokyo, Japan

Yasuaki Yokoyama


 

Average Co-Inventor Count = 4.6

ph-index = 7

Forward Citations = 169(Granted Patents)


Location History:

  • Yokohama, JP (1984 - 1994)
  • Yokkaichi, JP (1994 - 2001)
  • Tokyo, JP (2002 - 2016)

Company Filing History:


Years Active: 1984-2016

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15 patents (USPTO):Explore Patents

Title: Yasuaki Yokoyama: Innovator in Semiconductor Technology

Introduction

Yasuaki Yokoyama is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 15 patents. His work focuses on innovative solutions that enhance production processes and improve efficiency in the semiconductor industry.

Latest Patents

Yokoyama's latest patents include an exposure apparatus and exposure method designed to manage very small-quantity production and multiproduct production effectively. This invention features a mask aligner that exposes a wafer through a mask, incorporating a conveying device, an exposure stage, a mask holder, and an LED light source. Another notable patent is a composition and method for temporarily fixing solids, which utilizes a liquid crystal compound to securely bond two solids together. This method is particularly useful in the chemical mechanical polishing of wafers for semiconductor devices.

Career Highlights

Throughout his career, Yasuaki Yokoyama has worked with notable companies such as Japan Synthetic Rubber Co., Ltd. and JSR Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in semiconductor technology.

Collaborations

Yokoyama has collaborated with esteemed colleagues, including Nobuo Bessho and Yasuo Matsuki. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the industry.

Conclusion

Yasuaki Yokoyama's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in production processes and efficiency.

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