The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2016

Filed:

Dec. 04, 2012
Applicant:

National Institute of Advanced Industrial Science and Technology, Chiyoda-ku, Tokyo, JP;

Inventors:

Shiro Hara, Ushiku, JP;

Sommawan Khumpuang, Tsukuba, JP;

Yoshiki Inuzuka, Shizuoka, JP;

Yasuaki Yokoyama, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03F 7/20 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70716 (2013.01); G03F 7/2051 (2013.01); G03F 7/70733 (2013.01); H01L 21/677 (2013.01); H01L 21/67733 (2013.01); H01L 21/67736 (2013.01); H01L 21/67796 (2013.01);
Abstract

To provide a mask aligner that can appropriately manage very small-quantity production and multiproduct production. The present invention is a mask alignerthat exposes a wafer W in a predetermined size through a mask M, and has a configuration that includes: a conveying devicefor conveying the wafer W and the mask M; an exposure stageon which the wafer W conveyed by the conveying deviceis installed; a mask holderthat is mounted to face the exposure stageand on which the mask M conveyed by the conveying deviceis installed; and an LED light sourcemounted to face the exposure stagevia the mask holder


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