The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 1994

Filed:

Dec. 29, 1992
Applicant:
Inventors:

Fumitaka Takinishi, Yokohama, JP;

Makiko Togo, Fuchu, JP;

Masayuki Endo, Yokohama, JP;

Yasuaki Yokoyama, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ; C08G / ; C08G / ; C08G / ;
U.S. Cl.
CPC ...
5253273 ; 5253269 ; 5253294 ; 5253303 ; 5253305 ; 525375 ; 525382 ; 525384 ; 525386 ; 525523 ; 525525 ; 525533 ;
Abstract

A material for forming a coating film which comprises a compound having at least one glycidyl group in the molecule, a compound having a substituent capable of reacting with the glycidyl group, and a compound having a heterocyclic structure containing secondary nitrogen atom and/or tertiary nitrogen atom. The material is excellent in transparency and flatness and has high solvent resistance, particularly high alkaline resistance and imparts high hardness to a coating to a coating film formed therefrom.


Find Patent Forward Citations

Takinishi, Fumitaka. (1994). Material for forming coating film (U.S. Patent No. 5364910). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5364910

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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