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For the Inventor, By the Inventor

Guilderland, NY, United States of America

Xuefeng Hua

USPTO Granted Patents = 11 

Average Co-Inventor Count = 3.9

ph-index = 5

Forward Citations = 61(Granted Patents)


Company Filing History:

goldMedal11 out of 164,108 
 
International Business Machines Corporation
 patents
silverMedal1 out of 29 
 
Freescale Semiconductors Inc.
 patents
where one patent can have more than one assignee

Years Active: 2011-2013

where 'Filed Patents' based on already Granted Patents

11 patents (USPTO):
1. 8569868 - Device having and method for forming fins with multiple widths (2013-10-29),
2. 8536630 - Transistor devices and methods of making (2013-09-17),
3. 8525186 - Method of forming a planar field effect transistor with embedded and faceted source/drain stressors on a silicon-on-insulator (SOI) wafer, a planar field effect transistor structure and a design structure for the planar field effect transistor (2013-09-03),
4. 8513718 - Stress enhanced transistor devices and methods of making (2013-08-20),
5. 8324036 - Device having and method for forming fins with multiple widths for an integrated circuit (2012-12-04),
6. 8216893 - Stress enhanced transistor devices and methods of making (2012-07-10),
7. 8084329 - Transistor devices and methods of making (2011-12-27),
8. 7951657 - Method of forming a planar field effect transistor with embedded and faceted source/drain stressors on a silicon-on-insulator (S0I) wafer, a planar field effect transistor structure and a design structure for the planar field effect transistor (2011-05-31),
9. 7936017 - Reduced floating body effect without impact on performance-enhancing stress (2011-05-03),
10. 7932136 - Source/drain junction for high performance MOSFET formed by selective EPI process (2011-04-26),
11. 7883829 - Lithography for pitch reduction (2011-02-08),

Title: Innovations by Xuefeng Hua: A Glimpse into his Impact on Semiconductor Technology

Introduction

Xuefeng Hua, an accomplished inventor based in Guilderland, NY, has significantly contributed to the field of semiconductor technology. With a remarkable portfolio of 11 patents, Hua’s innovations focus on enhancing the efficiency and functionality of semiconductor devices.

Latest Patents

Among his latest patents is a groundbreaking device that includes a method for forming fins with multiple widths. This innovative structure provides a unique approach to semiconductor design, allowing for features that are integrally and continuously connected to each other. Specifically, it comprises a first feature with a width dimension less than the minimum feature size achievable by lithography and a second feature meeting or exceeding this minimum size. Furthermore, another significant patent concerns the fabrication of transistor devices. This method involves carefully structuring semiconductor tops with a gate conductor and optimizing the manufacturing process through techniques like anisotropic etching and oxidation.

Career Highlights

Throughout his professional journey, Xuefeng Hua has gained valuable expertise while working with prominent companies like International Business Machines Corporation and Freescale Semiconductors Inc. His experience at these industry leaders has undoubtedly shaped his innovative capabilities and problem-solving skills within semiconductor technology.

Collaborations

Hua has had the opportunity to work alongside talented colleagues such as Johnathan E Faltermeier and Kangguo Cheng. Together, they have contributed to advancing semiconductor techniques and developing efficient manufacturing processes that enhance device performance.

Conclusion

Xuefeng Hua's contributions to semiconductor technology showcase the vital role of innovation in this rapidly evolving field. Through his patents, he continues to influence how we understand and implement semiconductor devices. As the landscape of technology expands, inventors like Hua remain at the forefront, driving progress and shaping the future.

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