The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2011

Filed:

May. 15, 2008
Applicants:

William F. Clark, Jr., Essex Junction, VT (US);

Toshiharu Furukawa, Essex Junction, VT (US);

Xuefeng Hua, Guilderland, NY (US);

Charles W. Koburger, Iii, Delmar, NY (US);

Robert R. Robison, Colchester, VT (US);

Inventors:

William F. Clark, Jr., Essex Junction, VT (US);

Toshiharu Furukawa, Essex Junction, VT (US);

Xuefeng Hua, Guilderland, NY (US);

Charles W. Koburger, III, Delmar, NY (US);

Robert R. Robison, Colchester, VT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/01 (2006.01); H01L 27/12 (2006.01); H01L 31/0392 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method, gated device and design structure are presented for providing reduced floating body effect (FBE) while not impacting performance enhancing stress. One method includes forming damage in a portion of a substrate adjacent to a gate; removing a portion of the damaged portion to form a trench, leaving another portion of the damaged portion at least adjacent to a channel region; and substantially filling the trench with a material to form a source/drain region.


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