Xiafang Zhang

Title: The Innovations of Xiafang Zhang

Introduction

Xiafang Zhang is a prominent inventor based in San Jose, CA. He has made significant contributions to the field of optical scatterometry and dielectric layer properties. With a total of 6 patents, his work has advanced the understanding and application of various technologies.

Latest Patents

One of his latest patents is titled "Method of determining an asymmetric property of a structure." This method involves measuring two different signals obtained by optical scatterometry for a grating structure. By determining the difference between these signals, an asymmetric structural parameter can be calculated. Another notable patent is "Method and apparatus for determining dielectric layer properties." This invention discloses a method for determining properties such as dielectric thickness and leakage for multilayer film stacks on semiconducting or conducting substrates. The process includes depositing electrical charge on localized regions and measuring electrical quantities to ascertain the properties of the dielectric layer.

Career Highlights

Xiafang Zhang has worked with notable companies such as Kla Tencor Corporation and KLA-Tencor Technologies Corporation. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects in the field.

Collaborations

Throughout his career, Xiafang has collaborated with talented individuals, including Jianou Shi and Shiyou Pei. These partnerships have fostered a creative environment that has led to groundbreaking advancements in technology.

Conclusion

Xiafang Zhang's contributions to the field of inventions, particularly in optical scatterometry and dielectric layer properties, showcase his innovative spirit and dedication to advancing technology. His patents reflect a commitment to solving complex problems and enhancing the understanding of structural properties.