The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 19, 2016

Filed:

Oct. 08, 2010
Applicants:

Meng-fu Shih, San Jose, CA (US);

In-kyo Kim, Cupertino, CA (US);

Xiafang Zhang, San Jose, CA (US);

Leonid Poslavsky, Belmont, CA (US);

Inventors:

Meng-Fu Shih, San Jose, CA (US);

In-Kyo Kim, Cupertino, CA (US);

Xiafang Zhang, San Jose, CA (US);

Leonid Poslavsky, Belmont, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 3/36 (2006.01); G01B 11/30 (2006.01); G01N 21/00 (2006.01); G03F 7/20 (2006.01); G01N 21/47 (2006.01); G01N 21/956 (2006.01); G01N 21/21 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70616 (2013.01); G01N 21/211 (2013.01); G01N 21/47 (2013.01); G01N 21/4788 (2013.01); G01N 21/956 (2013.01); G01B 2210/56 (2013.01); G01N 21/9501 (2013.01); G01N 2021/213 (2013.01); G01N 2201/1296 (2013.01);
Abstract

Methods of determining asymmetric properties of structures are described. A method includes measuring, for a grating structure, a first signal and a second, different, signal obtained by optical scatterometry. A difference between the first signal and the second signal is then determined. An asymmetric structural parameter of the grating structure is determined based on a calculation using the first signal, the second signal, and the difference.


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