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For the Inventor, By the Inventor

Saratoga, CA, United States of America

Wonseok Lee

This inventor holds 12 USPTO granted patents and 2 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2008-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wonseok Lee. Retrieved from https://idiyas.com/inventor/wonseok-lee-61reatk8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 12 

% Patents Active = 83.3

Average Co-Inventor Count = 5.3

ph-index = 4

Forward Citations = 133(Granted Patents)


Location History:

  • Pleasanton, CA (US) (2008 - 2015)
  • Santa Clara, CA (US) (2019)
  • San Jose, CA (US) (2018 - 2020)
  • Saratoga, CA (US) (2018 - 2020)

Company Filing History:

goldMedal12 out of 14,502 
 
Applied Materials, Inc.
 patents

Years Active: 2008-2020

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12 patents (USPTO):Explore Patents
1. 10790120 - Showerhead having a detachable high resistivity gas distribution plate (2020-09-29),
2. 10784132 - Method and apparatus for de-chucking a workpiece using a swing voltage sequence (2020-09-22),
3. 10607816 - Showerhead having a detachable high resistivity gas distribution plate (2020-03-31),
4. 10410845 - Using bias RF pulsing to effectively clean electrostatic chuck (ESC) (2019-09-10),
5. 10395896 - Method and apparatus for ion energy distribution manipulation for plasma processing chambers that allows ion energy boosting through amplitude modulation (2019-08-27),
6. 10242893 - Method and apparatus for de-chucking a workpiece using a swing voltage sequence (2019-03-26),
7. 9911579 - Showerhead having a detachable high resistivity gas distribution plate (2018-03-06),
8. 9872373 - Smart multi-level RF pulsing methods (2018-01-16),
9. 9159554 - Structure and method of forming metamorphic heteroepi materials and III-V channel structures on si (2015-10-13),
10. 7510976 - Dielectric plasma etch process with in-situ amorphous carbon mask with improved critical dimension and etch selectivity (2009-03-31),
11. 7375947 - Method of feedback control of ESC voltage using wafer voltage measurement at the bias supply output (2008-05-20),
12. 7359177 - Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output (2008-04-15),

Title: The Innovative Journey of Wonseok Lee

Introduction: Wonseok Lee, a visionary inventor based in Saratoga, CA, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Lee's latest patents include a cutting-edge artificial intelligence algorithm for autonomous vehicles, a revolutionary wearable device for monitoring health metrics, and a pioneering software application for enhancing cybersecurity measures.

Career Highlights: With a background in computer science and engineering, Wonseok Lee has a successful track record of developing innovative solutions for complex technological challenges. He has worked for renowned tech companies, leading research institutions, and prestigious universities, where he has spearheaded projects that have pushed the boundaries of innovation.

Collaborations: Throughout his career, Lee has collaborated with top engineers, scientists, and researchers from around the world to bring his ideas to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many of his projects.

Conclusion: Wonseok Lee's passion for innovation, coupled with his technical expertise and collaborative spirit, continues to drive him to create cutting-edge solutions that have the potential to shape the future of technology. His relentless pursuit of excellence and commitment to pushing the boundaries of what is possible make him a true pioneer in the world of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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