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For the Inventor, By the Inventor

Fountain Hill, PA, United States of America

William Jack Casteel, Jr

This inventor holds 32 USPTO granted patents and 7 published patent applications and 9 EPO patents, primarily in Adsorbent Technologies. Top assignees: Air Products and Chemicals, Inc., Versum Materials US, LLC. Active years: 2001-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: William Jack Casteel, Jr. Retrieved from https://idiyas.com/inventor/william-jack-casteel-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 32 

% Patents Active = 78.1

 

Average Co-Inventor Count = 3.6

ph-index = 6

Forward Citations = 117(Granted Patents)


Location History:

  • Emmaus, PA (US) (2001 - 2018)
  • Fountain Hill, PA (US) (2009 - 2021)

Company Filing History:

goldMedal25 out of 3,219 
 
Air Products and Chemicals, Inc.
 patents
silverMedal7 out of 222 
 
Versum Materials US, LLC
 patents

Years Active: 2001-2021

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Areas of Expertise:
Hydrogen Impurity Removal
Activated Alumina Adsorbent
TiN Hard Mask Removal
RHO Zeolites
Stripping Compositions
Electrochemical Devices
Lithium Salts Purification
Proton Conducting Mediums
Fluorination Processes
Polyfluorinated Boron Clusters
Dodecaborate Compositions
Etchant Solutions
32 patents (USPTO):Explore Patents
1. 11173451 - Removal of hydrogen impurity from gas streams (2021-11-16),
2. 10799849 - Alkali-promoted activated alumina adsorbent (2020-10-13),
3. 10711227 - TiN hard mask and etch residue removal (2020-07-14),
4. 10654024 - RHO zeolites and method of making the same (2020-05-19),
5. 10647950 - Cleaning formulations (2020-05-12),
6. 10646848 - RHO adsorbent compositions, methods of making and using them (2020-05-12),
7. 10343139 - Processes using improved RHO adsorbent compositions (2019-07-09),
8. 10332784 - Selectively removing titanium nitride hard mask and etch residue removal (2019-06-25),
9. 10301580 - Stripping compositions having high WN/W etching selectivity (2019-05-28),
10. 10252242 - Alkali-promoted activated alumina adsorbent (2019-04-09),
11. 9976111 - TiN hard mask and etch residual removal (2018-05-22),
12. 9976037 - Composition for treating surface of substrate, method and device (2018-05-22),
13. 9925514 - Modified chabazite adsorbent compositions, methods of making and using them (2018-03-27),
14. 9873833 - Etchant solutions and method of use thereof (2018-01-23),
15. 9755269 - Dodecaborate salt radical anion compositions and methods for making and using such compositions (2017-09-05),

Certainly! Here is the article you requested:

Title: Innovator Spotlight: William Jack Casteel, Jr.

Introduction: Meet William Jack Casteel, Jr., a prolific inventor hailing from Fountain Hill, PA (US) with an impressive portfolio of 33 patents.

Latest Patents:

1. Removal of hydrogen impurity from gas streams: Casteel's innovative process efficiently removes trace hydrogen from dry gas streams using a specialized hopcalite catalyst, offering enhanced hydrogen capacity and improved operational parameters.

2. Alkali-promoted activated alumina adsorbent: His adsorbent technology effectively removes CO2 from gas mixtures by optimizing the carbonate to alumina ratio through a unique washing process.

Career Highlights: Casteel has made significant contributions to companies like Air Products and Chemicals, Inc., and Versum Materials US, LLC, where his inventive spirit and technical expertise have driven groundbreaking solutions in the field of gas purification.

Collaborations: Throughout his career, Casteel has collaborated with esteemed professionals such as Wade Hampton Bailey, III, and Sergei Vladimirovich Ivanov, fostering a culture of innovation and knowledge exchange.

Conclusion: William Jack Casteel, Jr.'s relentless pursuit of excellence and groundbreaking inventions continues to redefine the landscape of gas purification technologies. His impactful work stands as a testament to the power of innovation and ingenuity in shaping a brighter future.

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Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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