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For the Inventor, By the Inventor

Mountain View, CA, United States of America

Wendy H Yeh

This inventor holds 13 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Lithography Techniques. Top assignee: Applied Materials, Inc.. Active years: 2005-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wendy H Yeh. Retrieved from https://idiyas.com/inventor/wendy-h-yeh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 13 

% Patents Active = 38.5


Average Co-Inventor Count = 4.7

ph-index = 5

Forward Citations = 165(Granted Patents)


Company Filing History:

goldMedal13 out of 14,523 
 
Applied Materials, Inc.
 patents

Years Active: 2005-2012

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Areas of Expertise:
High NA Lithography
Immersion Lithography
Amorphous Carbon
CVD Deposition
Photoresist Adhesion
Reticle Fabrication
DSA Processing
Particulate Contamination
Antireflective Coating
Critical Dimension Control
Semiconductor Fabrication
Integration Schemes
13 patents (USPTO):Explore Patents
1. 8125034 - Graded ARC for high NA and immersion lithography (2012-02-28),
2. 7776516 - Graded ARC for high NA and immersion lithography (2010-08-17),
3. 7737040 - Method of reducing critical dimension bias during fabrication of a semiconductor device (2010-06-15),
4. 7718081 - Techniques for the use of amorphous carbon (APF) for various etch and litho integration schemes (2010-05-18),
5. 7642195 - Hydrogen treatment to improve photoresist adhesion and rework consistency (2010-01-05),
6. 7407893 - Liquid precursors for the CVD deposition of amorphous carbon films (2008-08-05),
7. 7365014 - Reticle fabrication using a removable hard mask (2008-04-29),
8. 7262106 - Absorber layer for DSA processing (2007-08-28),
9. 7109087 - Absorber layer for DSA processing (2006-09-19),
10. 7105442 - Ashable layers for reducing critical dimensions of integrated circuit features (2006-09-12),
11. 7094442 - Methods for the reduction and elimination of particulate contamination with CVD of amorphous carbon (2006-08-22),
12. 7064078 - Techniques for the use of amorphous carbon (APF) for various etch and litho integration scheme (2006-06-20),
13. 6853043 - Nitrogen-free antireflective coating for use with photolithographic patterning (2005-02-08),

Title: Wendy H Yeh: Innovator in Lithography Technology

Introduction

Wendy H Yeh is a prominent inventor based in Mountain View, CA, known for her significant contributions to lithography technology. With a total of 13 patents to her name, she has made remarkable advancements in the field, particularly in the development of anti-reflective coatings.

Latest Patents

One of her latest patents is titled "Graded ARC for high NA and immersion lithography." This innovative method involves forming a device using a graded anti-reflective coating. The process includes creating one or more amorphous carbon layers on a substrate, followed by the formation of an anti-reflective coating (ARC) on these layers. The ARC layer features an absorption coefficient that varies across its thickness. An energy-sensitive resist material is then applied to the ARC layer, allowing for the introduction of a pattern through exposure to patterned radiation. The developed image of the pattern is crucial for the device's functionality.

Career Highlights

Wendy H Yeh is currently employed at Applied Materials, Inc., where she continues to push the boundaries of innovation in her field. Her work has been instrumental in enhancing the efficiency and effectiveness of lithography processes.

Collaborations

Throughout her career, Wendy has collaborated with notable colleagues, including Christopher Dennis Bencher and Hichem M'Saad. These partnerships have contributed to her success and the advancement of technology in her area of expertise.

Conclusion

Wendy H Yeh stands out as a leading inventor in the realm of lithography technology. Her innovative patents and contributions to Applied Materials, Inc. highlight her dedication to advancing the field. Her work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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