The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2012
Filed:
Jun. 09, 2010
Wendy H. Yeh, Mountain View, CA (US);
Martin J. Seamons, San Jose, CA (US);
Matthew Spuller, Palo Alto, CA (US);
Sum-yee Betty Tang, San Jose, CA (US);
Kwangduk Douglas Lee, Santa Clara, CA (US);
Sudha Rathi, San Jose, CA (US);
Wendy H. Yeh, Mountain View, CA (US);
Martin J. Seamons, San Jose, CA (US);
Matthew Spuller, Palo Alto, CA (US);
Sum-Yee Betty Tang, San Jose, CA (US);
Kwangduk Douglas Lee, Santa Clara, CA (US);
Sudha Rathi, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of forming a device using a graded anti-reflective coating is provided. One or more amorphous carbon layers are formed on a substrate. An anti-reflective coating (ARC) is formed on the one or more amorphous carbon layers wherein the ARC layer has an absorption coefficient that varies across the thickness of the ARC layer. An energy sensitive resist material is formed on the ARC layer. An image of a pattern is introduced into the layer of energy sensitive resist material by exposing the energy sensitive resist material to patterned radiation. The image of the pattern introduced into the layer of energy sensitive resist material is developed.