Sum-Yee Betty Tang

Title: Innovations of Sum-Yee Betty Tang

Introduction

Sum-Yee Betty Tang is a notable inventor based in San Jose, California. She has made significant contributions to the field of lithography, particularly through her innovative patents. With a total of six patents to her name, her work has had a considerable impact on device fabrication technologies.

Latest Patents

One of her latest patents is titled "Graded ARC for high NA and immersion lithography." This patent describes a method of forming a device using a graded anti-reflective coating. The process involves forming one or more amorphous carbon layers on a substrate. An anti-reflective coating (ARC) is then applied to these layers, with the ARC layer having an absorption coefficient that varies across its thickness. Following this, an energy-sensitive resist material is formed on the ARC layer. The method includes introducing an image of a pattern into the resist material by exposing it to patterned radiation, which is then developed to reveal the pattern.

Career Highlights

Throughout her career, Sum-Yee Betty Tang has worked with prominent companies, including Applied Materials, Inc. Her experience in these organizations has allowed her to refine her skills and contribute to groundbreaking advancements in her field.

Collaborations

She has collaborated with notable coworkers such as Martin Jay Seamons and Wendy H Yeh, who have also contributed to the advancements in lithography and related technologies.

Conclusion

Sum-Yee Betty Tang's innovative work in the field of lithography exemplifies her dedication to advancing technology. Her patents, particularly in graded anti-reflective coatings, showcase her expertise and commitment to innovation.