The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2007
Filed:
Jan. 15, 2004
Luc Van Autryve, Rixensart, BE;
Chris D. Bencher, San Jose, CA (US);
Dean Jennings, Beverly, MA (US);
Haifan Liang, Oakland, CA (US);
Abhilash J. Mayur, Salinas, CA (US);
Mark Yam, Monte Sereno, CA (US);
Wendy H. Yeh, Mountain View, CA (US);
Richard A. Brough, Wingdale, NY (US);
Luc Van Autryve, Rixensart, BE;
Chris D. Bencher, San Jose, CA (US);
Dean Jennings, Beverly, MA (US);
Haifan Liang, Oakland, CA (US);
Abhilash J. Mayur, Salinas, CA (US);
Mark Yam, Monte Sereno, CA (US);
Wendy H. Yeh, Mountain View, CA (US);
Richard A. Brough, Wingdale, NY (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of processing a substrate comprising depositing a layer comprising amorphous carbon on the substrate and then exposing the substrate to electromagnetic radiation have one or more wavelengths between about 600 nm and about 1000 nm under conditions sufficient to heat the layer to a temperature of at least about 300° C. is provided. Optionally, the layer further comprises a dopant selected from the group consisting of nitrogen, boron, phosphorus, fluorine, and combinations thereof. In one aspect, the layer comprising amorphous carbon is an anti-reflective coating and an absorber layer that absorbs the electromagnetic radiation and anneals a top surface layer of the substrate. In one aspect, the substrate is exposed to the electromagnetic radiation in a laser annealing process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile