Haifan Liang

Title: Haifan Liang: A Pioneer in Thermal Processing Technologies

Introduction

Haifan Liang is an influential inventor based in Fremont, CA, known for his significant contributions to the field of thermal processing technologies. With a remarkable portfolio of 37 patents, Liang has developed innovative approaches that enhance semiconductor manufacturing, notably through advanced laser applications.

Latest Patents

One of Liang’s latest innovations is the "Annealing apparatus using two wavelengths of radiation." This thermal processing apparatus utilizes two laser sources to improve the efficiency of annealing silicon wafers. The first laser source, a CO2 laser emitting at 10.6 μm, is focused onto the silicon wafer as a precise line beam. Meanwhile, the second laser, a GaAs laser bar emitting at 808 nm, surrounds the line beam and is synchronized to create a narrow heating pulse. This innovative method not only improves the manipulation of free carriers created by the GaAs radiation but also effectively utilizes the COradiation, which is absorbed by the free carriers, ensuring optimal thermal treatment of the silicon material.

Career Highlights

Throughout his career, Haifan Liang has held pivotal roles in notable companies, including Intermolecular, Inc., and Applied Materials, Inc. These organizations are recognized for their groundbreaking advancements in semiconductor technology and materials science. Liang's work in these companies has been instrumental in the evolution of thermal processing techniques, establishing him as a leader in his field.

Collaborations

Liang has also collaborated with prominent colleagues, including Mark Yam and Abhilash J Mayur. Their collective expertise in semiconductor technology has contributed to the success of various projects, further enhancing innovation in thermal processing methodologies.

Conclusion

Haifan Liang's contributions to thermal processing technologies and his extensive patent portfolio underline his role as a key inventor in the semiconductor industry. Through his innovative approaches and collaborations, Liang continues to push the boundaries of what is achievable in thermal processing, paving the way for future advancements in semiconductor manufacturing.