Rixensart, Belgium

Luc Van Autryve

This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2006-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Luc Van Autryve. Retrieved from https://idiyas.com/inventor/luc-van-autryve

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 8.0

ph-index = 2

Forward Citations = 14(Granted Patents)


Location History:

  • Mennecy, FR (2006)
  • Rixensart, BE (2007)

Company Filing History:


Years Active: 2006-2007

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2 patents (USPTO):Explore Patents

Title: Innovations by Luc Van Autryve: Pioneering Absorber Layer Technologies

Introduction

Luc Van Autryve, an inventor based in Rixensart, Belgium, has made significant contributions to the field of materials processing. With a total of two patents to his name, Van Autryve's work focuses on innovative methods for processing substrates, particularly through the utilization of amorphous carbon layers.

Latest Patents

Van Autryve's latest patents revolve around an innovative approach to DSA (Directed Self-Assembly) processing. The first patent details a method involving the deposition of a layer of amorphous carbon on a substrate, which is then subjected to electromagnetic radiation with wavelengths between 600 nm and 1000 nm. This process successfully heats the layer to at least 300°C. The additive aspects of this invention include the potential use of dopants such as nitrogen, boron, phosphorus, fluorine, and others, enhancing the functionality of the amorphous carbon as an anti-reflective coating and absorber layer. The second patent emphasizes a similar approach, focusing on laser annealing, where the amorphous carbon layer absorbs electromagnetic radiation from a laser, further refining the substrate’s surface layer.

Career Highlights

Luc Van Autryve's career is intertwined with his role at Applied Materials, Inc., a prominent player in materials engineering. His patents demonstrate his expertise in developing innovative solutions that enhance substrate processing, reflecting his commitment to advancing technology in the field.

Collaborations

Throughout his career, Van Autryve has collaborated with notable colleagues, including Chris D. Bencher and Dean C. Jennings. These partnerships have likely fostered an environment of innovation and idea exchange, contributing to the impressive advancements in substrate processing technologies.

Conclusion

Luc Van Autryve's contributions to the field of material science, particularly through his innovative patents on absorber layers and substrate processing, showcase his role as a leading inventor in the industry. His work not only enhances the technical capabilities of materials but also sets a foundation for future developments in DSA processing technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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