The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Nov. 04, 2002
Wendy H. Yeh, Mountain View, CA (US);
Sang Ahn, San Mateo, CA (US);
Christopher Dennis Bencher, Sunnyvale, CA (US);
Hichem M'saad, Santa Clara, CA (US);
Sudha Rathi, San Jose, CA (US);
Wendy H. Yeh, Mountain View, CA (US);
Sang Ahn, San Mateo, CA (US);
Christopher Dennis Bencher, Sunnyvale, CA (US);
Hichem M'Saad, Santa Clara, CA (US);
Sudha Rathi, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A layer of antireflective coating (ARC) material for use in photolithographic processing. In one embodiment the ARC material has the formula SiOH:C, where w, x, y and z represent the atomic percentage of silicon, oxygen, hydrogen and carbon, respectively, in the material and where w is between 35 and 55, x is between 35 and 55, y is between 4 and 15, z is between 0 and 3 and the atomic percentage of nitrogen in the material is less than or equal to 1 atomic percent.