Sang H Ahn

Title: **Innovative Contributions of Inventor Sang H. Ahn in Semiconductor Technologies**

Introduction

Sang H. Ahn is an accomplished inventor based in Foster City, California, with a notable portfolio of 14 patents. His contributions primarily focus on advancements in semiconductor technologies, particularly in enhancing the performance of photoresist during the manufacturing process. These innovations are crucial for the development of smaller, more efficient microchips.

Latest Patents

Among Sang H. Ahn’s recent achievements is a patent that addresses the maintenance of photoresist activity on the surface of dielectric anti-reflective coatings (DARC) for feature sizes as small as 90 nm. This patent identifies the necessity to eliminate hydroxyl groups from the DARC surface to mitigate the poisoning of photoresist during imaging. The solution proposed involves treating the DARC film surface with hydrogen or helium-containing plasma to achieve this goal.

Another significant patent focuses on reducing photoresist footing undercuts during the development of features sized 120 nm and smaller. Ahn determined that the detachment of photoresist during development is influenced by the footprint of the pattern and the contact angle between the substrate surface and the developing reagent. By maintaining a contact angle of approximately 30 degrees or greater, he managed to prevent detachment of the photoresist, thereby enhancing the effectiveness of photoresists designed for feature sizes around 90 nm.

Career Highlights

Sang H. Ahn has made remarkable strides in his career at Applied Materials, Inc., where he continues to apply his expertise in semiconductor manufacturing technologies. His work emphasizes innovative solutions that push the boundaries of existing technologies, positioning him as a leader in the field.

Collaborations

Throughout his career, Ahn has collaborated with esteemed colleagues, including Hichem M'Saad and Sudha S. Rathi. These collaborations have led to significant advancements in their shared fields, demonstrating the power of teamwork in driving innovation.

Conclusion

Sang H. Ahn's inventive contributions have made a lasting impact in the realm of semiconductor technology. His latest patents not only address critical challenges in the industry but also pave the way for future innovations that will enhance the performance and efficiency of microchip fabrication. As the demand for smaller and more powerful devices increases, Ahn's work will undoubtedly play a vital role in shaping the future of technology.