The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2012
Filed:
Dec. 13, 2006
Applicants:
Sang H. Ahn, Foster City, CA (US);
Sudha Rathi, San Jose, CA (US);
Heraldo L. Bothelho, Palo Alto, CA (US);
Inventors:
Sang H. Ahn, Foster City, CA (US);
Sudha Rathi, San Jose, CA (US);
Heraldo L. Bothelho, Palo Alto, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/30 (2006.01); H05H 1/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
We have determined that it is necessary to remove hydroxyl groups from the surface of a DARC over which a CAR photoresist is applied, to reduce poisoning of the photoresist during imaging. The poisoning is reduced by treating the surface of the DARC film with a hydrogen or helium-containing plasma which is capable of removing the hydroxyl groups.