Heraldo L Bothelho

Title: Innovator Heraldo L. Bothelho: Pioneering Advancements in Photoresist Technology

Introduction

Heraldo L. Bothelho is an accomplished inventor based in Palo Alto, California, with a notable contribution to the field of semiconductor technology. He holds two patents that address critical challenges in photoresist applications, particularly concerning the maintenance of photoresist activity and development processes critical to modern chip manufacturing.

Latest Patents

Heraldo's latest patents focus on two significant innovations in the realm of photoresist technology. The first patent, titled "Maintenance of photoresist activity on the surface of dielectric arcs for 90 nm feature sizes," outlines a method to optimize the application of a CAR photoresist on dielectric anti-reflective coatings (DARC). The innovation identifies the necessity of removing hydroxyl groups from the DARC surface, as these groups can poison the photoresist during imaging. The solution is to treat the DARC film surface with a hydrogen or helium-based plasma, effectively mitigating the interfering hydroxyl groups.

The second patent, "Reduction in photoresist footing undercut during development of feature sizes of 120NM or less," presents a breakthrough in understanding the detachment issues of photoresist during the development phase. This research pinpoints the reduced contact area of the pattern on the substrate and the contact angle between the substrate surface and the developing reagent as key factors. By maintaining a contact angle of approximately 30 degrees or greater, Heraldo’s method prevents the unintentional detachment of photoresist from the substrate for feature sizes around 90 nm. Furthermore, he achieves a superior contact angle between the DARC surface and a water-based CAR photoresist developer while simultaneously reducing CAR poisoning.

Career Highlights

Heraldo L. Bothelho contributes his expertise as an inventor at Applied Materials, Inc., a leading company in the field of materials engineering for electronics. His innovative work has directly impacted the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Heraldo has collaborated with talented professionals, including his coworkers Sang H. Ahn and Sudha S. Rathi. This collaborative environment has fostered significant advancements in the technology underlying modern photoresist applications.

Conclusion

Heraldo L. Bothelho exemplifies the innovative spirit at the heart of semiconductor technology. His patents are critical in advancing photoresist technologies, ensuring better performance and reliability in the manufacturing of next-generation electronic devices. His contributions not only enhance production efficiencies but also pave the way for future innovations in the field.