Christopher Dennis Bencher

Cupertino, CA, United States of America

Christopher Dennis Bencher

This inventor holds 107 USPTO granted patents and 22 published patent applications and 4 EPO patents, primarily in Digital Lithography (CPC class G03F7-70291). Top assignees: Applied Materials, Inc., Varian Semiconductor Equipment Associates, Inc.. Active years: 2002-2026.

USPTO Granted Patents = 107 

% Patents Active = 63.6

 

Average Co-Inventor Count = 2.9

ph-index = 16

Forward Citations = 3,338(Granted Patents)

Forward Citations (Not Self Cited) = 3,199(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Sunnyvale, CA (US) (2002 - 2012)
  • San Jose, CA (US) (2002 - 2014)
  • Cupertino, CA (US) (2015 - 2024)
  • Santa Clara, CA (US) (2024)

Company Filing History:


Years Active: 2002-2026

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Areas of Expertise:
Digital Lithography
Micro-LED Displays
Image Stabilization
Phase Shift Control
Maskless Lithography
Wire Grid Polarizer
Spatial Light Modulator
Subpixel Crosstalk
Line Edge Roughness
Optical Material Layer
Charged Particle Device
Dose Maps
107 patents (USPTO):Explore Patents

Title: Christopher Dennis Bencher: A Visionary in Digital Lithography Innovation

Introduction: Christopher Dennis Bencher, a renowned inventor based in Cupertino, CA, has left an indelible mark in the industry through his passion for innovation and pursuit of excellence. His visionary approach to digital lithography systems has positioned him as a leading figure in the field.

Latest Patents: With a remarkable portfolio of 99 patents, Christopher Dennis Bencher's latest innovations include groundbreaking technologies such as "Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems" and "Decreasing distortion by modifying pixel spacing." These patents showcase his commitment to advancing the field of lithography with cutting-edge solutions.

Career Highlights: Throughout his career, Christopher Dennis Bencher has held key positions at companies such as Applied Materials, Inc. and Varian Semiconductor Equipment Associates, Inc. His expertise and contributions have significantly impacted the development of digital lithography systems, paving the way for new possibilities in the industry.

Collaborations: Christopher Dennis Bencher has collaborated with esteemed colleagues such as Joseph R Johnson and Thomas L Laidig, bringing together a wealth of knowledge and experience to drive innovation forward. These collaborations have led to groundbreaking inventions and advancements in the field of lithography.

Conclusion: Christopher Dennis Bencher's relentless pursuit of innovation and his visionary approach to digital lithography systems have established him as a pioneer in the industry. With a strong focus on excellence and pushing boundaries, he continues to shape the future of digital lithography with his remarkable inventions and patents.

Profile summary based on public USPTO records.
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