The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2023
Filed:
May. 10, 2022
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Joseph R. Johnson, Redwood City, CA (US);
Christopher Dennis Bencher, Cupertino, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G02B 26/10 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70466 (2013.01); G03F 7/70191 (2013.01); G02B 26/105 (2013.01);
Abstract
Methods for patterning a substrate are described. A substrate is scanned using a spatial light modulator with a plurality of exposures timed according to a non-crystalline shot pattern. Lithography systems for performing the substrate patterning method and non-transitory computer-readable medium for executing the patterning method are also described.
Johnson, Joseph. (2023). Method to achieve non-crystalline evenly distributed shot pattern for digital lithography (U.S. Patent No. 11815818). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11815818
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile