The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2006
Filed:
Jul. 13, 2004
Martin Jay Seamons, San Jose, CA (US);
Wendy H. Yeh, Mountain View, CA (US);
Sudha S. R. Rathi, San Jose, CA (US);
Heraldo L. Botelho, Palo Alto, CA (US);
Martin Jay Seamons, San Jose, CA (US);
Wendy H. Yeh, Mountain View, CA (US);
Sudha S. R. Rathi, San Jose, CA (US);
Heraldo L. Botelho, Palo Alto, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method is provided for forming an amorphous carbon layer, deposited on a dielectric material such as oxide, nitride, silicon carbide, carbon doped oxide, etc., or a metal layer such as tungsten, aluminum or poly-silicon. The method includes the use of chamber seasoning, variable thickness of seasoning film, wider spacing, variable process gas flows, post-deposition purge with inert gas, and post-deposition plasma purge, among others, to make the deposition of an amorphous carbon film at low deposition temperatures possible without any defects or particle contamination.