Company Filing History:
Years Active: 2006-2009
Title: Sudha S R Rathi: Innovator in Amorphous Carbon Film Technology
Introduction
Sudha S R Rathi is a prominent inventor based in San Jose, CA, known for his contributions to the field of materials science, particularly in the deposition of amorphous carbon films. With a total of three patents to his name, Rathi has made significant advancements that have implications in various applications, including semiconductor manufacturing.
Latest Patents
Rathi's latest patents include innovative methods for depositing amorphous carbon materials. One notable patent describes a method of depositing an amorphous carbon film for etch hardmask applications. This invention outlines a process for processing a substrate that involves forming a dielectric material layer, depositing an amorphous carbon layer using a processing gas that includes hydrocarbon compounds and an argon carrier gas, and generating a plasma through a dual-frequency RF source. The resulting amorphous carbon layer can serve multiple functions, such as an etch stop or an anti-reflective coating.
Another significant patent focuses on the use of liquid precursors for the chemical vapor deposition (CVD) of amorphous carbon films. This method includes positioning the substrate in a processing chamber, introducing a processing gas that comprises a carrier gas, hydrogen, and precursor compounds, and generating a plasma to deposit the amorphous carbon layer on the substrate.
Career Highlights
Sudha S R Rathi is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to apply his innovative ideas in a practical setting, contributing to the advancement of technology in the field.
Collaborations
Rathi has collaborated with notable coworkers, including Martin Jay Seamons and Wendy H Yeh, who have also contributed to advancements in materials science and technology.
Conclusion
Sudha S R Rathi's work in the deposition of amorphous carbon films showcases his innovative spirit and dedication to advancing technology in the semiconductor industry. His patents reflect a commitment to improving processes that are essential for modern manufacturing.
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