Taipei, Taiwan

Wen-Kuo Hsieh

This inventor holds 17 USPTO granted patents and 2 published patent applications. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wen-Kuo Hsieh. Retrieved from https://idiyas.com/inventor/wen-kuo-hsieh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 17 

% Patents Active = 64.7

Average Co-Inventor Count = 4.0

ph-index = 5

Forward Citations = 555(Granted Patents)


Location History:

  • Changhua County, TW (2013)
  • Hsin-Chu, TW (2016)
  • Taipei, TW (2013 - 2023)

Company Filing History:


Years Active: 2013-2026

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17 patents (USPTO):Explore Patents

Title: Innovations of Wen-Kuo Hsieh

Introduction

Wen-Kuo Hsieh is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 17 patents. His work focuses on improving the efficiency and effectiveness of semiconductor devices.

Latest Patents

One of his latest patents is titled "Transistor source/drain contacts and methods of forming the same." This invention involves a method that includes depositing a protective layer on a source/drain region and a gate mask, which is disposed on a gate structure. The gate structure is situated on a channel region of a substrate, which adjoins the source/drain region. The method further includes etching an opening through the protective layer to expose the source/drain region, depositing a metal in the opening and on the protective layer, and annealing the metal to form a metal-semiconductor alloy region on the source/drain region. Additionally, the process involves removing residue of the metal from the opening with a cleaning process, while the protective layer covers the gate mask during this cleaning process. Another notable patent is related to "Curing photo resist for improving etching selectivity." This method includes exposing and developing a negative photo resist, followed by a treatment using an electron beam. After this treatment, a layer underlying the photo resist is etched using the negative photo resist as an etching mask.

Career Highlights

Wen-Kuo Hsieh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate and develop new technologies. His expertise in semiconductor manufacturing has positioned him as a key player in the industry.

Collaborations

Wen-Kuo has collaborated with several talented individuals, including Chung-Chi Ko and Ming-Chung Liang, who contribute to the advancement of semiconductor technologies alongside him.

Conclusion

Wen-Kuo Hsieh's contributions to semiconductor technology through his patents and collaborations highlight his importance in the field. His innovative methods continue to shape the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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