Changhua, Taiwan

Wen-Jia Hsieh

This inventor holds 18 USPTO granted patents and 1 published patent application, primarily in Semiconductor Technology. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2017-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wen-Jia Hsieh. Retrieved from https://idiyas.com/inventor/wen-jia-hsieh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 18 

% Patents Active = 100.0

Average Co-Inventor Count = 3.2

ph-index = 4

Forward Citations = 80(Granted Patents)


Location History:

  • Pusin Township, Changhua County, TW (2017)
  • Changhyua County, TW (2021)
  • Changhua County, TW (2018 - 2023)
  • Pusin Township, TW (2017 - 2024)

Company Filing History:


Years Active: 2017-2025

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Areas of Expertise:
Semiconductor Structure
Gate Electrode
Contact Plug
FinFET Device
Fabrication Method
Metal Gate
Device Manufacturing
Enlarged Gate
Plug Formation
Device Structure
Semiconductor Device
Contact Mechanism
18 patents (USPTO):Explore Patents

Title: Innovations and Patents of Wen-Jia Hsieh

Introduction: Wen-Jia Hsieh is a renowned inventor based in Changhua County, Taiwan. With a remarkable portfolio of 18 patents, he has significantly contributed to the field of semiconductor technology.

Latest Patents: Wen-Jia Hsieh's latest notable inventions include a semiconductor structure with an enlarged gate electrode structure and a method for forming the same. This invention encompasses a gate stack structure situated over a substrate, characterized by a gate electrode structure with a first and second portion. The first portion has a wider top surface than the bottom surface of the second portion, illustrating an innovative approach to semiconductor design. Another significant patent features a gate structure and the method of fabricating the same. This design includes a spacer defining a gate region on a semiconductor substrate, alongside a gate dielectric layer and a unique configuration of work function metal layers.

Career Highlights: Wen-Jia Hsieh currently works at Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leader in the semiconductor industry known for its advanced manufacturing technologies and innovation. His extensive experience and expertise have positioned him as a key player in the development of cutting-edge semiconductor solutions.

Collaborations: Throughout his career, Wen-Jia Hsieh has collaborated with esteemed colleagues such as Yi-Chun Lo and Bo-Wen Hsieh. Their joint efforts exemplify the spirit of teamwork and innovation within the company, pushing the boundaries of semiconductor technology.

Conclusion: Wen-Jia Hsieh's contributions to the field of semiconductor technology through his patents highlight his role as an influential inventor. His latest innovations continue to drive advancements in the industry, shaping the future of semiconductor applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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