Portland, OR, United States of America

Wang Yueh

USPTO Granted Patents = 23 

Average Co-Inventor Count = 2.9

ph-index = 8

Forward Citations = 630(Granted Patents)


Location History:

  • Shrewsbury, MA (US) (2001 - 2010)
  • Portland, OR (US) (2005 - 2011)

Company Filing History:


Years Active: 2001-2011

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23 patents (USPTO):

Title: The Innovative Contributions of Wang Yueh in Semiconductor Technology

Introduction

Wang Yueh is an accomplished inventor based in Portland, OR, with an impressive portfolio of 23 patents to his name. His innovations primarily focus on advancements in photoresist materials and methods, crucial for the semiconductor manufacturing process.

Latest Patents

Among his latest inventions, Wang has developed methods and compositions aimed at reducing line wide roughness (LWR) in semiconductor devices. One embodiment details a non-chemically amplified photoresist that incorporates a developer-soluble resin (DSR) and a photoactive compound (PAC). This innovative formulation significantly enhances the distribution of PAC within the DSR, leading to reduced acid diffusion and, consequently, a decrease in LWR. Such advancements are critical in modern fabrication techniques, particularly in extreme ultraviolet (EUV) lithography, where achieving feature sizes around 15 nm with an LWR of less than 1.5 nm is essential.

Another notable patent involves the development of new polymers containing phenol repeat units and photoacid-labile esters with alicyclic groups. These innovative polymers are integral to chemically-amplified positive-acting resists, offering improvements that could enhance the efficiency and effectiveness of photoresist applications.

Career Highlights

Wang Yueh has made significant contributions while working at prominent companies such as Intel Corporation and Shipley Company, L.L.C. His work at these organizations has played a pivotal role in advancing semiconductor technologies, emphasizing the importance of effective materials in producing high-quality electronic components.

Collaborations

Throughout his career, Wang has collaborated with esteemed colleagues including George G. Barclay and Heidi B. Cao. These partnerships have fostered a rich environment for innovation, combining diverse expertise to tackle complex challenges in semiconductor manufacturing.

Conclusion

Wang Yueh's extensive patent portfolio and collaboration with leading figures in the industry underscore his commitment to advancing semiconductor technology. His latest innovations in photoresist materials represent a significant leap toward enhanced manufacturing processes, playing a crucial role in the development of smaller, more efficient electronic devices.

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