The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7459260 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 02, 2008

Filed:

Mar. 29, 2005
Applicants:

Manish Chandhok, Beaverton, OR (US);

Wang Yueh, Portland, OR (US);

Heidi Cao, Portland, OR (US);

Inventors:

Manish Chandhok, Beaverton, OR (US);

Wang Yueh, Portland, OR (US);

Heidi Cao, Portland, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
Abstract

A modified EUV photoresist and a method of making the resist. The modified resist includes an EUV photoresist and a LAM incorporated into the EUV photoresist.


Find Patent Forward Citations

Chandhok, Manish. (2008). Method of reducing sensitivity of euv photoresists to out-of-band radiation and euv photoresists formed according to the method (U.S. Patent No. 7459260). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7459260

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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