IDiyas

For the Inventor, By the Inventor

Portland, OR, United States of America

Heidi B Cao

USPTO Granted Patents = 11 

Average Co-Inventor Count = 2.5

ph-index = 3

Forward Citations = 494(Granted Patents)


Company Filing History:

goldMedal11 out of 54,688 
 
Intel Corporation
 patents

Years Active: 2005-2010

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11 patents (USPTO):Explore Patents
1. 7723008 - Photoactive adhesion promoter in a slam (2010-05-25),
2. 7718528 - Photoactive adhesion promoter in a SLAM (2010-05-18),
3. 7459260 - Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method (2008-12-02),
4. 7442487 - Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists (2008-10-28),
5. 7427463 - Photoresists with reduced outgassing for extreme ultraviolet lithography (2008-09-23),
6. 7374867 - Enhancing photoresist performance using electric fields (2008-05-20),
7. 7226718 - Non-outgassing low activation energy resist (2007-06-05),
8. 7166413 - Enabling chain scission of branched photoresist (2007-01-23),
9. 7147986 - Resist compounds including acid labile groups attached to polymeric chains at anhydride linkages (2006-12-12),
10. 7005227 - One component EUV photoresist (2006-02-28),
11. 6872505 - Enabling chain scission of branched photoresist (2005-03-29),

Title: The Innovative Contributions of Heidi B. Cao

Introduction

Heidi B. Cao is a prominent inventor based in Portland, OR (US). She has made significant contributions to the field of semiconductor manufacturing, holding a total of 11 patents. Her work focuses on improving semiconductor processes, particularly in reducing undesirable effects during manufacturing.

Latest Patents

One of her latest patents is titled "Photoactive Adhesion Promoter in a SLAM." This invention addresses semiconductor process challenges such as line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with the removal of photoresist layers. The invention utilizes a photoacid generator (PAG) material in conjunction with a sacrificial light absorbing material (SLAM) to mitigate these issues. Furthermore, her approach allows for the efficient application of PAG in semiconductor manufacturing, requiring fewer processing operations than traditional techniques.

Career Highlights

Heidi B. Cao is currently employed at Intel Corporation, where she continues to innovate and contribute to advancements in semiconductor technology. Her expertise and dedication have positioned her as a key figure in her field.

Collaborations

Throughout her career, Heidi has collaborated with notable colleagues, including Wang Yueh and Robert P. Meagley. These partnerships have further enhanced her research and development efforts.

Conclusion

Heidi B. Cao's innovative work in semiconductor manufacturing exemplifies her commitment to advancing technology. Her contributions, particularly in the area of photoactive adhesion promoters, have the potential to significantly improve manufacturing processes.

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