The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2008
Filed:
Oct. 06, 2003
Robert Bristol, Portland, OR (US);
Heidi Cao, Portland, OR (US);
Manish Chandhok, Portland, OR (US);
Robert Meagley, Hillsboro, OR (US);
Vijayakumar S. Ramachandrarao, Hillsboro, OR (US);
Robert Bristol, Portland, OR (US);
Heidi Cao, Portland, OR (US);
Manish Chandhok, Portland, OR (US);
Robert Meagley, Hillsboro, OR (US);
Vijayakumar S. Ramachandrarao, Hillsboro, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Electric fields may be advantageously used in various steps of photolithographic processes. For example, prior to the pre-exposure bake, photoresists that have been spun-on the wafer may be exposed to an electric field to orient aggregates or other components within the unexposed photoresist. By aligning these aggregates or other components with the electric field, line edge roughness may be reduced, for example in connection with 193 nanometer photoresist. Likewise, during exposure, electric fields may be applied through uniquely situated electrodes or using a radio frequency coil. In addition, electric fields may be applied at virtually any point in the photolithography process by depositing a conductive electrode, which is subsequently removed during development. Finally, electric fields may be applied during the developing process to improve line edge roughness.