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For the Inventor, By the Inventor

Hillsboro, OR, United States of America

Vijayakumar S Ramachandrarao

USPTO Granted Patents = 21

Average Co-Inventor Count = 2.2

ph-index = 7

Forward Citations = 188(Granted Patents)


Location History:

  • Hillsboro, OR (US) (2003 - 2011)
  • Portland, OR (US) (2007 - 2011)

Company Filing History:

goldMedal21 out of 54,664 
 
Intel Corporation
 patents

Years Active: 2003-2011

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21 patents (USPTO):
1. 8017568 - Cleaning residues from semiconductor structures (2011-09-13),
2. 7977228 - Methods for the formation of interconnects separated by air gaps (2011-07-12),
3. 7605073 - Sealants for metal interconnect protection in microelectronic devices having air gap interconnect structures (2009-10-20),
4. 7422020 - Aluminum incorporation in porous dielectric for improved mechanical properties of patterned dielectric (2008-09-09),
5. 7374867 - Enhancing photoresist performance using electric fields (2008-05-20),
6. 7335586 - Sealing porous dielectric material using plasma-induced surface polymerization (2008-02-26),
7. 7303648 - Via etch process (2007-12-04),
8. 7268015 - Method for wafer stacking using copper structures of substantially uniform height (2007-09-11),
9. 7238604 - Forming thin hard mask over air gap or porous dielectric (2007-07-03),
10. 7233068 - Filling small dimension vias using supercritical carbon dioxide (2007-06-19),
11. 7179757 - Replenishment of surface carbon and surface passivation of low-k porous silicon-based dielectric materials (2007-02-20),
12. 7101443 - Supercritical carbon dioxide-based cleaning of metal lines (2006-09-05),
13. 7049053 - Supercritical carbon dioxide to reduce line edge roughness (2006-05-23),
14. 7038324 - Wafer stacking using interconnect structures of substantially uniform height (2006-05-02),
15. 7022655 - Highly polar cleans for removal of residues from semiconductor structures (2006-04-04),

Title: Innovations by Vijayakumar S Ramachandrarao in Semiconductor Technology

Introduction

Vijayakumar S Ramachandrarao, based in Hillsboro, OR, is a distinguished inventor with an impressive portfolio of 21 patents. His work primarily focuses on cutting-edge semiconductor technology, addressing critical challenges in the field and offering innovative solutions.

Latest Patents

Among his latest patents, one is focused on "Cleaning residues from semiconductor structures," which explores the utilization of supercritical carbon dioxide to effectively remove resistant residues from etching dielectrics in fluorine-based plasma gases. This approach may incorporate an oxidizer for enhanced efficacy. Another significant contribution is in the area of "Methods for the formation of interconnects separated by air gaps," which outlines a fabrication process using silicon-based interlayer dielectric materials. This method effectively removes the interlayer dielectric material between adjacent interconnects, creating air gaps that can improve device performance.

Career Highlights

Vijayakumar works at Intel Corporation, a global leader in semiconductor manufacturing and innovation. His expertise and innovative thinking have significantly contributed to advancing the company's technological capabilities.

Collaborations

Throughout his career, Vijayakumar has collaborated with notable colleagues, including David H Gracias and Robert B Turkot, Jr. Together, they have worked on groundbreaking projects that push the boundaries of semiconductor technology and innovation.

Conclusion

Vijayakumar S Ramachandrarao exemplifies the spirit of innovation in the semiconductor industry. With his extensive patent portfolio and collaborations with esteemed professionals, he continues to lead advancements that will shape the future of technology.

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