The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2006
Filed:
Jun. 11, 2003
Vijayakumar Ramachandrarao, Hillsboro, OR (US);
Hyun-mog Park, Beaverton, OR (US);
Subramanyam Iyer, Santa Clara, CA (US);
Bob Turkot, Hillsboro, OR (US);
Vijayakumar Ramachandrarao, Hillsboro, OR (US);
Hyun-Mog Park, Beaverton, OR (US);
Subramanyam Iyer, Santa Clara, CA (US);
Bob Turkot, Hillsboro, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Polymer aggregates in a photoresist layer may be dissolved or reduced in dimension by treatment with supercritical carbon dioxide. The supercritical carbon dioxide may be used before and/or after development of the photoresist. The SCCOtreatment causes swelling of the photoresist and may allow polymer aggregates in the photoresist to be dissolved. Controlled release of the carbon dioxide de-swells the photoresist, resulting in reduced line edge roughness of openings in the photoresist and reduced resistance of metal lines formed in the openings.