Company Filing History:
Years Active: 2006
Title: The Innovative Mind of Bob Turkot in Hillsboro, OR
Introduction
Bob Turkot is a notable inventor based in Hillsboro, Oregon, recognized for his significant contributions to the field of photolithography through the development of innovative methods to enhance photoresist performance. His commitment to advancing technology is exemplified by his patented work and collaborative spirit.
Latest Patents
Turkot holds a patent for utilizing supercritical carbon dioxide to reduce line edge roughness in photoresist layers. His invention focuses on dissolving or reducing the dimensions of polymer aggregates within a photoresist layer by applying supercritical carbon dioxide. This treatment can occur before or after the development of the photoresist, resulting in swelling that allows for the dissolution of polymer aggregates. The controlled release of carbon dioxide de-swell the photoresist, leading to improved line edge roughness in the openings and decreased resistance in the metal lines formed.
Career Highlights
Throughout his career, Bob Turkot has made strides in the semiconductor industry, showcasing his expertise at Intel Corporation. His innovative approaches and patented technologies have contributed to advancements in manufacturing processes, proving invaluable in the development of high-performance electronic devices.
Collaborations
In his role at Intel Corporation, Turkot collaborates with esteemed colleagues, including Vijayakumar S Ramachandrarao and Hyun-Mog Park. These collaborations highlight the importance of teamwork in driving technological advancements and fostering innovation in the industry.
Conclusion
Bob Turkot’s work serves as a testament to the impact of ingenuity and collaboration in technology. His patent has paved the way for enhanced photoresist applications, showcasing the potential of supercritical carbon dioxide in industrial processes. Turkot’s contributions continue to influence the landscape of semiconductor manufacturing and inspire future generations of inventors.