The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2007
Filed:
Jun. 01, 2005
Shan C. Clark, Forest Grove, OR (US);
Kim-khanh Ho, Fremont, CA (US);
James S. Clarke, Portland, OR (US);
Ernisse S. Putna, Beaverton, OR (US);
Wang S. Yueh, Portland, OR (US);
Robert P. Meagley, Hillsboro, OR (US);
Shan C. Clark, Forest Grove, OR (US);
Kim-Khanh Ho, Fremont, CA (US);
James S. Clarke, Portland, OR (US);
Ernisse S. Putna, Beaverton, OR (US);
Wang S. Yueh, Portland, OR (US);
Robert P. Meagley, Hillsboro, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A basic developer/quencher solution formulated to include at least one supercritical fluid or liquid solvent and a base may be used to quench a photo-generated acid within a photoresist as well as develop the photoresist. The supercritical fluid or liquid solvent may be carbon dioxide and the base may be quaternary ammonium salt that has side groups that increase the solubility of the quaternary ammonium salt in carbon dioxide.